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In den WarenkorbZustand: New. In.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
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In den WarenkorbZustand: New. In.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
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In den WarenkorbZustand: New. In.
Sprache: Englisch
Verlag: VDM Verlag Dr. Müller|VDM Verlag Dr. Müller e.K., 2008
ISBN 10: 3639096622 ISBN 13: 9783639096620
Anbieter: moluna, Greven, Deutschland
EUR 80,84
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In den WarenkorbZustand: New. Embedded capacitor technology, where thin filmcapacitors are integrated at on-chip and/or off-chiplevels, offers high packaging densities and improvedelectrical performance at potentially reduced costsof capacitor fabrication and integration. Thisresearch e.
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In den WarenkorbPaperback. Zustand: Brand New. 173 pages. 9.30x6.20x0.41 inches. In Stock.
Sprache: Englisch
Verlag: VDM Verlag Dr. Müller, VDM Verlag Dr. Müller E.K., 2008
ISBN 10: 3639096622 ISBN 13: 9783639096620
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Taschenbuch. Zustand: Neu. Neuware - Embedded capacitor technology, where thin filmcapacitors are integrated at on-chip and/or off-chiplevels, offers high packaging densities and improvedelectrical performance at potentially reduced costsof capacitor fabrication and integration. Thisresearch explores and establishes the leverages ofusing thin film embedded capacitors over currentlyused surface mount discrete capacitors. Inparticular, this work focuses on developing pulseddc reactively sputtered tantalum oxide (Ta2O5) thinfilm capacitors for IC chips and packages. A designspace for breakdown voltage and capacitance densityof planar capacitors is established, with filmthickness and material dielectric constant asparameters. The validity of the developed designspace is experimentally verified with Ta2O5 thinfilms over a wide range of film thickness. Anexperimentally verified analytical model for pulseddc reactive sputtering of Ta2O5 films is describedand evaluated. Various processing and integrationchallenges in depositing thin films using reactivesputtering and their effects on electricalperformance of thin-film capacitors are discussed.