david gilmer (11 Ergebnisse)

ALL UK PARCELS SENT TRACKED! ALL OVERSEAS PARCELS SENT AIRMAIL, TRACKED! (S/hand, Hardcover, 1979). 1979 1st edition. Pp106. B/w photographs, bibliography. Some use but very good in dust-wrapper. The author "makes this exciting sport easy to learn for the entire family. .This book is a series of easy to grasp explanations of the basic fly fishing techniques". Rainbow trout, brook trout, cutthroat trout, largemouth and smallmouth bass, black bass, crappies and pinefish, white and yellow perch. .

Paperback. Zustand: Brand New. 120 pages. 9.00x6.00x0.25 inches. In Stock.

1985, January. Journals, Birds, Natural History. Wildlife Monographs, a Publication of The Wildlife Society. #92. 37p.

Hardcover. Zustand: Brand New. 120 pages. 9.25x6.50x0.75 inches. In Stock.

**Pp. Zustand: Sehr gut. 560 Seiten , 1350 g - gutes u. sauberes Exemplar mit wenigen bis normalen Spuren am Einband (Rücken vom Licht gebleicht), innen sehr gut (siehe auch mein Foto) [sw.] --- Good condition with normal to only small signs of use w Sprache: Englisch Gewicht in Gramm: 1350.

Zustand: New. In.

Zustand: New. In.

Taschenbuch. Zustand: Neu. High Dielectric Constant Materials | VLSI MOSFET Applications | Howard Huff (u. a.) | Taschenbuch | Springer Series in Advanced Microelectronics | xxiv | Englisch | 2010 | Springer | EAN 9783642059216 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.

Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.

Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.

Zustand: Very Good. Original stapled colour illustrated souvenir motion picture programme in thick card wrap covers (soft back). 11'' x 8½''. 24 printed pages with colour and monochrome photographic action stills throughout. In Very Good condition. Member of the P.B.F.A. CINEMA, SCREEN & FILMS.