Sprache: Englisch
Verlag: W. H. Freeman (edition 3rd), 1997
ISBN 10: 0716731460 ISBN 13: 9780716731467
Anbieter: BooksRun, Philadelphia, PA, USA
Paperback. Zustand: Very Good. 3rd. It's a well-cared-for item that has seen limited use. The item may show minor signs of wear. All the text is legible, with all pages included. It may have slight markings and/or highlighting.
Paperback. Zustand: Fair. No Jacket. Readable copy. Pages may have considerable notes/highlighting. ~ ThriftBooks: Read More, Spend Less.
Anbieter: Majestic Books, Hounslow, Vereinigtes Königreich
EUR 24,47
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Anbieter: ThriftBooks-Dallas, Dallas, TX, USA
Hardcover. Zustand: Very Good. No Jacket. May have limited writing in cover pages. Pages are unmarked. ~ ThriftBooks: Read More, Spend Less.
Sprache: Englisch
Verlag: Athens, GA ; London : University of Georgia Press, 1987, 1987
ISBN 10: 0820309117 ISBN 13: 9780820309118
Anbieter: Joseph Valles - Books, Stockbridge, GA, USA
Erstausgabe
Hardcover. Zustand: Very Good. No Jacket. 1st Edition. 154 pp. ; illustrated ; yellow cloth ; no dustjacket ; Contents: An unknown South: Spanish explorers and Southeastern Chiefdoms / Charles Hudson -- Reordering their world: A Caddoan ethnohistory / George Sabo -- The Cherokee in Arkansas: An invisible archaeological resource / Hester A Davis -- The Easter and Tug-of-War Lynchings and the Early Twentieth-Century black exodus from southwest Missouri / Butron L. Purrington, Penny Harter -- A structural analysis of the Chinese grocery store in the Mississippi Delta / Mary Jo Schneider, William M Schneider -- From memories and from the ground: Historical archaelogy at the Moser farmstead in the Arkansas Ozarks / Leslie C Stewart-Abernathy -- Frontier settlement in the Current River Valley: Variation in organizational planning / Cynthia R Price -- Camp meeting and Archaism in southwestern Arkansas / James A Rees -- Commentary / James Peacock. ; ex-lib, stamps, labels ; else VG. Book.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
EUR 228,96
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In den WarenkorbZustand: New. In.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
EUR 228,96
Anzahl: Mehr als 20 verfügbar
In den WarenkorbZustand: New. In.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
EUR 228,96
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Anbieter: Buchpark, Trebbin, Deutschland
Zustand: Sehr gut. Zustand: Sehr gut | Seiten: 524 | Sprache: Englisch | Produktart: Bücher | The first international symposium on the subject "The Physics and Chemistry of Si02 and the Si-Si02 Interface," organized in association with the Electrochemical Society, Inc. , was held in Atlanta, Georgia on May 15- 20, 1988. This symposium contained sixty papers and was so successful that the sponsoring divisions decided to schedule it on a regular basis every four years. Thus, the second symposium on "The Physics and Chemistry of Si02 and the Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri, again sponsored by the Electronics and Dielectrics Science and Technology Divisions of The Electrochemical Society. This volume contains manuscripts of most of the fifty nine papers presented at the 1992 symposium, and is divided into eight chapters - approximating the organization of the symposium. Each chapter is preceded with an introduction by the session organizers. It is appropriate to provide a general assessment of the current status and understanding of the physics and chemistry of Si02 and the Si02 interface before proceeding with a brief overview of the individual chapters. Semiconductor devices have continued to scale down in both horizontal and vertical dimensions. This has resulted in thinner gate and field oxides as well as much closer spacing of individual device features. As a result, surface condition, native oxide composition, and cleaning and impurity effects now provide a much more significant contribution to the properties of oxides and their interfaces.
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - The first international symposium on the subject 'The Physics and Chemistry of Si02 and the Si-Si02 Interface,' organized in association with the Electrochemical Society, Inc. , was held in Atlanta, Georgia on May 15- 20, 1988. This symposium contained sixty papers and was so successful that the sponsoring divisions decided to schedule it on a regular basis every four years. Thus, the second symposium on 'The Physics and Chemistry of Si02 and the Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri, again sponsored by the Electronics and Dielectrics Science and Technology Divisions of The Electrochemical Society. This volume contains manuscripts of most of the fifty nine papers presented at the 1992 symposium, and is divided into eight chapters - approximating the organization of the symposium. Each chapter is preceded with an introduction by the session organizers. It is appropriate to provide a general assessment of the current status and understanding of the physics and chemistry of Si02 and the Si02 interface before proceeding with a brief overview of the individual chapters. Semiconductor devices have continued to scale down in both horizontal and vertical dimensions. This has resulted in thinner gate and field oxides as well as much closer spacing of individual device features. As a result, surface condition, native oxide composition, and cleaning and impurity effects now provide a much more significant contribution to the properties of oxides and their interfaces.
Sprache: Englisch
Verlag: Springer US, Springer New York, 2013
ISBN 10: 1489907769 ISBN 13: 9781489907769
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - The properties of Si02 and the Si-Si02 interface provide the key foundation onto which the majority of semiconductor device technology has been built Their study has consumed countless hours of many hundreds of investigators over the years, not only in the field of semiconductor devices but also in ceramics, materials science, metallurgy, geology, and mineralogy, to name a few. These groups seldom have contact with each other even though they often investigate quite similar aspects of the Si02 system. Desiring to facilitate an interaction between these groups we set out to organize a symposium on the Physics and Chemistry of Si()z and the Si-Si()z Interface under the auspices of The Electrochemical Society, which represents a number of the appropriate groups. This symposium was held at the 173rd Meeting of The Electrochemical Society in Atlanta, Georgia, May 15-20, 1988. These dates nearly coincided with the ten year anniversary of the 'International Topical Conference on the Physics of Si02 and its Interfaces' held at mM in 1978. We have modeled the present symposium after the 1978 conference as well as its follow on at North Carolina State in 1980. Of course, much progress has been made in that ten years and the symposium has given us the opportunity to take a multidisciplinary look at that progress.
Sprache: Englisch
Verlag: Springer US, Springer New York, 1993
ISBN 10: 0306444194 ISBN 13: 9780306444197
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - The first international symposium on the subject 'The Physics and Chemistry of Si02 and the Si-Si02 Interface,' organized in association with the Electrochemical Society, Inc. , was held in Atlanta, Georgia on May 15- 20, 1988. This symposium contained sixty papers and was so successful that the sponsoring divisions decided to schedule it on a regular basis every four years. Thus, the second symposium on 'The Physics and Chemistry of Si02 and the Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri, again sponsored by the Electronics and Dielectrics Science and Technology Divisions of The Electrochemical Society. This volume contains manuscripts of most of the fifty nine papers presented at the 1992 symposium, and is divided into eight chapters - approximating the organization of the symposium. Each chapter is preceded with an introduction by the session organizers. It is appropriate to provide a general assessment of the current status and understanding of the physics and chemistry of Si02 and the Si02 interface before proceeding with a brief overview of the individual chapters. Semiconductor devices have continued to scale down in both horizontal and vertical dimensions. This has resulted in thinner gate and field oxides as well as much closer spacing of individual device features. As a result, surface condition, native oxide composition, and cleaning and impurity effects now provide a much more significant contribution to the properties of oxides and their interfaces.
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - The properties of Si02 and the Si-Si02 interface provide the key foundation onto which the majority of semiconductor device technology has been built Their study has consumed countless hours of many hundreds of investigators over the years, not only in the field of semiconductor devices but also in ceramics, materials science, metallurgy, geology, and mineralogy, to name a few. These groups seldom have contact with each other even though they often investigate quite similar aspects of the Si02 system. Desiring to facilitate an interaction between these groups we set out to organize a symposium on the Physics and Chemistry of Si()z and the Si-Si()z Interface under the auspices of The Electrochemical Society, which represents a number of the appropriate groups. This symposium was held at the 173rd Meeting of The Electrochemical Society in Atlanta, Georgia, May 15-20, 1988. These dates nearly coincided with the ten year anniversary of the 'International Topical Conference on the Physics of Si02 and its Interfaces' held at mM in 1978. We have modeled the present symposium after the 1978 conference as well as its follow on at North Carolina State in 1980. Of course, much progress has been made in that ten years and the symposium has given us the opportunity to take a multidisciplinary look at that progress.
Anbieter: BUCHSERVICE / ANTIQUARIAT Lars Lutzer, Wahlstedt, Deutschland
Hardcover. Zustand: gut. 1995. Reihe/Serie: Head and Neck Surgery, 3 Vols. in 4 Pts. ; 1/1 Verlagsort: Stuttgart Sprache: englisch Maße: 230 x 300 mm Gewicht: 2272 g Medizinische Fachgebiete surgery Ästhetische und Plastische Chirurgie Medizin Pharmazie Medizinische Fachgebiete HNO-Heilkunde Chirurg Plastische Chirurgie Gesicht Anatomie Gesichtsschädel Halschirurgie Medizin Klinische Fächer HNO-Heilkunde Kopfchirurgie Nase Zahnmedizin ISBN-10: 3-13-546902-6 / 3135469026 ISBN-13: 978-3-13-546902-7 / 9783135469027 Head and neck surgery face nose and facial skull part 1 Hans H. Naumann Ernst R. Kastenbauer Eugene Tardy surgeon Ästhetische und Plastische Chirurgie Medizin Pharmazie Medizinische Fachgebiete HNO-Heilkunde Chirurg Plastische Chirurgie Gesicht Anatomie Gesichtsschädel Halschirurgie Medizin Klinische Fächer HNO-Heilkunde Kopfchirurgie Nase Zahnmedizin Zus.-Arb.: Edited by J. Helms, C. Herberhold, R.A. Jahrsdoerfer E.R. Kastenbauer, W.R. Panje, M.E. Tardy Coordinator Editor: H.H. Naumann In englischer Sprache. 464 pages. 230 x 300 mm.
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In den WarenkorbPaperback. Zustand: Brand New. reprint edition. 519 pages. 9.25x6.10x1.05 inches. In Stock.
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In den WarenkorbPaperback. Zustand: Brand New. 570 pages. 9.30x6.20x1.30 inches. In Stock.