Sprache: Englisch
Verlag: Berlin ; Heidelberg : Springer, 2011
ISBN 10: 3642163033 ISBN 13: 9783642163036
Anbieter: Kepler-Buchversand Huong Bach, Weil der Stadt, Deutschland
Gr.-8°, gebundene Ausgabe. Zustand: Sehr gut. XIII, 104 S. : graph. Darst. Gebraucht: sehr guter Zustand. Contents: Introduction / The MOS STructure / The MOS Oxide and its Defects / Review of Transport Mechanism in Thin Oxides / of MOS Devices / Experimental Techniques / Theoretical Approaches of Mobile Ions Density Distribution Determination / Theoretical Model of Mobile Ions Distribution and Ionic Current in the MOS Oxide / Index. Sprache: Englisch Gewicht in Gramm: 315.
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Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
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Zustand: Sehr gut. Zustand: Sehr gut | Sprache: Englisch | Produktart: Bücher | This book focuses on the importance of mobile ions presented in oxide structures, what significantly affects the metal-oxide-semiconductor (MOS) properties. The reading starts with the definition of the MOS structure, its various aspects and different types of charges presented in their structure. A review on ionic transport mechanisms and techniques for measuring the mobile ions concentration in the oxides is given, special attention being attempted to the Charge Pumping (CP) technique associated with the Bias Thermal Stress (BTS) method. Theoretical approaches to determine the density of mobile ions as well as their distribution along the oxide thickness are also discussed. The content varies from general to very specific examples, helping the reader to learn more about transport in MOS structures.
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In den WarenkorbPaperback. Zustand: Brand New. 2011 edition. 117 pages. 9.25x6.10x0.28 inches. In Stock.
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In den WarenkorbHardcover. Zustand: Brand New. 104 pages. 9.00x6.25x0.75 inches. In Stock.
Anbieter: preigu, Osnabrück, Deutschland
Taschenbuch. Zustand: Neu. Transport in Metal-Oxide-Semiconductor Structures | Mobile Ions Effects on the Oxide Properties | Hamid Bentarzi | Taschenbuch | Engineering Materials | xiv | Englisch | 2013 | Springer | EAN 9783642266881 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.
Sprache: Englisch
Verlag: Springer Berlin Heidelberg, 2013
ISBN 10: 3642266886 ISBN 13: 9783642266881
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book focuses on the importance of mobile ions presented in oxide structures, what significantly affects the metal-oxide-semiconductor (MOS) properties. The reading starts with the definition of the MOS structure, its various aspects and different types of charges presented in their structure. A review on ionic transport mechanisms and techniques for measuring the mobile ions concentration in the oxides is given, special attention being attempted to the Charge Pumping (CP) technique associated with the Bias Thermal Stress (BTS) method. Theoretical approaches to determine the density of mobile ions as well as their distribution along the oxide thickness are also discussed. The content varies from general to very specific examples, helping the reader to learn more about transport in MOS structures.
Sprache: Englisch
Verlag: Springer Berlin Heidelberg, Springer Berlin Heidelberg, 2011
ISBN 10: 3642163033 ISBN 13: 9783642163036
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book focuses on the importance of mobile ions presented in oxide structures, what significantly affects the metal-oxide-semiconductor (MOS) properties. The reading starts with the definition of the MOS structure, its various aspects and different types of charges presented in their structure. A review on ionic transport mechanisms and techniques for measuring the mobile ions concentration in the oxides is given, special attention being attempted to the Charge Pumping (CP) technique associated with the Bias Thermal Stress (BTS) method. Theoretical approaches to determine the density of mobile ions as well as their distribution along the oxide thickness are also discussed. The content varies from general to very specific examples, helping the reader to learn more about transport in MOS structures.
Sprache: Englisch
Verlag: Engineering Science Reference, 2020
ISBN 10: 1799869210 ISBN 13: 9781799869214
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
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Sprache: Englisch
Verlag: Engineering Science Reference, 2020
ISBN 10: 1799840271 ISBN 13: 9781799840275
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