Verlag: Materials Research Society, 1996
ISBN 10: 1558993320 ISBN 13: 9781558993327
Sprache: Englisch
Anbieter: Better World Books: West, Reno, NV, USA
Zustand: Very Good. Used book that is in excellent condition. May show signs of wear or have minor defects.
Verlag: Cambridge University Press, U.S.A., 1993
ISBN 10: 1558991999 ISBN 13: 9781558991996
Sprache: Englisch
Anbieter: RIVERLEE BOOKS, Waltham Cross, HERTS, Vereinigtes Königreich
EUR 57,55
Anzahl: 1 verfügbar
In den WarenkorbHardcover. Zustand: New. Brand new Unread but may have "damaged" stamp on one of the title pages due to cosmetic imperfection such as minor dents on cover or edge of pages or scratches on cover etc. Hardcover.
Zustand: Gut. Zustand: Gut | Sprache: Englisch | Produktart: Bücher.
Zustand: Gut. Zustand: Gut | Sprache: Englisch | Produktart: Bücher.
Zustand: Gut. Zustand: Gut | Sprache: Englisch | Produktart: Bücher.
Verlag: Springer Netherlands, Springer Netherlands Mär 1996, 1996
ISBN 10: 0792340116 ISBN 13: 9780792340119
Sprache: Englisch
Anbieter: buchversandmimpf2000, Emtmannsberg, BAYE, Deutschland
Buch. Zustand: Neu. Neuware -Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 582 pp. Englisch.
Verlag: Springer Netherlands, Springer Netherlands, 1996
ISBN 10: 0792340116 ISBN 13: 9780792340119
Sprache: Englisch
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Verlag: Springer Netherlands, Springer Netherlands, 2010
ISBN 10: 9048146968 ISBN 13: 9789048146963
Sprache: Englisch
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Zustand: Sehr gut. Zustand: Sehr gut | Sprache: Englisch | Produktart: Bücher.
Zustand: Sehr gut. Zustand: Sehr gut | Sprache: Englisch | Produktart: Bücher.
Verlag: Kluwer Academic Publishers, 1996
ISBN 10: 0792340116 ISBN 13: 9780792340119
Sprache: Englisch
Anbieter: Kennys Bookstore, Olney, MD, USA
Zustand: New. Proceedings of the NATO Advanced Study Institute, Acquafredda di Maratea, Italy, July 3-14, 1995 Editor(s): Roozeboom, Fred. Series: NATO Science Series E:. Num Pages: 578 pages, biography. BIC Classification: PHFC; TJFD5. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 235 x 155 x 31. Weight in Grams: 989. . 1996. Hardback. . . . . Books ship from the US and Ireland.
Anbieter: Revaluation Books, Exeter, Vereinigtes Königreich
EUR 617,42
Anzahl: 2 verfügbar
In den WarenkorbPaperback. Zustand: Brand New. 584 pages. 9.00x6.25x1.31 inches. In Stock.
Verlag: Kluwer Academic s, 1996
Anbieter: Buchpark, Trebbin, Deutschland
Zustand: Sehr gut. Zustand: Sehr gut | Produktart: Bücher.