Atomic layer deposition (53 Ergebnisse)

Zustand: New. In English.

PAP. Zustand: New. New Book. Shipped from UK. Established seller since 2000.

Zustand: New. In English.

PAP. Zustand: New. New Book. Shipped from UK. Established seller since 2000.

PAP. Zustand: New. New Book. Shipped from UK. Established seller since 2000.

PAP. Zustand: New. New Book. Shipped from UK. Established seller since 2000.

Zustand: New.

Zustand: New. In English.

PAP. Zustand: New. New Book. Shipped from UK. Established seller since 2000.

PAP. Zustand: New. New Book. Shipped from UK. Established seller since 2000.

Taschenbuch. Zustand: Neu. Nanofabrication Revolution: Atomic Layer Deposition and Etching at the Nanoscale | Johnson | Taschenbuch | Englisch | 2024 | tredition | EAN 9783384254269 | Verantwortliche Person für die EU: tredition GmbH, Heinz-Beusen-Stieg 5, 22926 Ahrensburg, info[at]tredition[dot]de | Anbieter: preigu.…

Zustand: New.

Zustand: New. In English.

Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - Master's Thesis from the year 2015 in the subject Physics - Electrodynamics, grade: 1.0, Dresden Technical University (Faculty of Electrical and Computer Engineering/Institute of Semiconductors and Microsystems), course: Nanoelectronic Systems, language: English, abstract: Nickel and nickel(II) oxide are widely used in advanced electronic devices. In microelectronic industry, nickel is used to form nickel silicide. The nickel mono-silicide (NiSi) has emerged as an excellent material of choice for source-drain contact applications below 45 nm node CMOS technology. As compared to other silicides used for the contact applications, NiSi is preferred because of its low resistivity, low contact resistance, relatively low formation temperature and low silicon consumption. Nickel is used in nickel-based rechargeable batteries and ferromagnetic random access memories (RAMs). Nickel(II) oxide is utilized as transistor gate-oxide and oxide in resistive RAMs. Atomic Layer Deposition (ALD) is a special type of Chemical Vapor Deposition (CVD) technique, that is used to deposit very smooth as well as homogeneous thin films with excellent conformality even at high aspect ratios. In spite of huge number of practical applications of nickel and nickel(II) oxide, a few nickel precursors are available for thermal based ALD. Moreover, these precursors have resulted in poor film qualities and the process properties were also limited. Therefore in this master thesis, the properties of various novel nickel precursors had to be evaluated. All novel precursors are heteroleptic (different types of ligands) complexes and were specially designed by the manufacturer for thermal based ALD of pure nickel with hydrogen as a co-reactant. In order to evaluate the novel precursors, a new methodology was designed to test small amounts (down to 2 g) of precursors in a very time efficient way. This methodology includes: TGA/DTA curve analyses of the precursors, thermal stability tests in which the precursors ( 0.1 g) were heated at elevated temperatures in a sealed environment for several hours, deposition experiments, and film characterizations. The depositions were monitored with the help of in situ quartz crystal microbalance, while application related film properties like chemical composition, physical phase, thickness, density, roughness and sheet resistance were investigated with the help of ex situ measurement techniques. [.]. …

Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Taschenbuch. Zustand: Neu. FORMATION OF HgCdTe (MCT) BY ELECTROCHEMICAL ATOMIC LAYER DEPOSITION | AN INVESTIGATION INTO BANDGAP ENGINEERING | Venkatram Venkatasamy | Taschenbuch | 116 S. | Englisch | 2011 | LAP LAMBERT Academic Publishing | EAN 9783844323979 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu. …

Paperback. Zustand: Brand New. 376 pages. 9.18x6.12x9.21 inches. In Stock.

Taschenbuch. Zustand: Neu. Thin Films of Multiferroic BiCoO3 | by Atomic Layer Deposition | Knut Bjarne Gandrud | Taschenbuch | 144 S. | Englisch | 2010 | LAP LAMBERT Academic Publishing | EAN 9783838326511 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu.…

Paperback. Zustand: Brand New. 286 pages. 9.18x6.12x9.21 inches. In Stock.

Taschenbuch. Zustand: Neu. Plasma-enhanced atomic layer deposition of high-quality gallium nitrid | Sanjie Liu (u. a.) | Taschenbuch | Englisch | 2026 | LAP LAMBERT Academic Publishing | EAN 9786209554735 | Verantwortliche Person für die EU: LAP Lambert Academic Publishing, Brivibas Gatve 197, 1039 RIGA, LETTLAND, customerservice[at]vdm-vsg[dot]de | Anbieter: preigu.…

Taschenbuch. Zustand: Neu. Recent Advances in Atomic Layer Deposition | for Photonics Device Nanostructures | Muhammad Rizwan Saleem | Taschenbuch | 204 S. | Englisch | 2015 | Scholars' Press | EAN 9783639517378 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu.…

Paperback. Zustand: New.

Zustand: Used. pp. 276 170 Illus. (81 Col.).

HRD. Zustand: New. New Book. Shipped from UK. Established seller since 2000.

Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic layer deposition processes. The underlying principles in atomic layer deposition rely on the chemistry of a precursor with a surface.…

Zustand: New. In English.

Zustand: Used. pp. 276.

Taschenbuch. Zustand: Neu. Emerging Atomic Layer Deposition for Hydrogen Energy | Peter Ozaveshe Oviroh (u. a.) | Taschenbuch | Springer Series in Materials Science | xxxii | Englisch | 2026 | Springer | EAN 9783031677762 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu. …

Zustand: New. In English.