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In den WarenkorbHardcover. 243 S.; Ill. Very good. Shrink wrapped. Sprache: Englisch Gewicht in Gramm: 685.
Sprache: Englisch
Verlag: BNA Books (Bureau of National Affairs), 2000
ISBN 10: 1570181284 ISBN 13: 9781570181283
Anbieter: ThriftBooks-Dallas, Dallas, TX, USA
Hardcover. Zustand: Fair. No Jacket. Readable copy. Pages may have considerable notes/highlighting. ~ ThriftBooks: Read More, Spend Less.
Anbieter: Romtrade Corp., STERLING HEIGHTS, MI, USA
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In den WarenkorbZustand: New. Leading experts address questions of public and private roles in assessing, managing, and mitigating major risks to public health and safety in light of the devastation caused by Hurricane Katrina.Über den AutorRonald J. Daniels.
Anbieter: Romtrade Corp., STERLING HEIGHTS, MI, USA
Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
Anbieter: Romtrade Corp., STERLING HEIGHTS, MI, USA
Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
Anbieter: Majestic Books, Hounslow, Vereinigtes Königreich
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In den WarenkorbZustand: New. pp. xxviii + 337 Illus.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
EUR 164,11
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In den WarenkorbZustand: New. In.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
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In den WarenkorbZustand: New. In.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
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In den WarenkorbZustand: New. In.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
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In den WarenkorbZustand: New. In.
Taschenbuch. Zustand: Neu. Wafer Level 3-D ICS Process Technology | Chuan Seng Tan (u. a.) | Taschenbuch | xii | Englisch | 2010 | Springer Us | EAN 9781441945624 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.
Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - Three-dimensional (3D) integration is clearly the simplest answer to most of the semiconductor industry's vexing problems: heterogeneous integration and red- tions of power, form factor, delay, and even cost. Conceptually the power, latency, and form factor of a system with a xed number of transistors all scale roughly linearly with the diameter of the smallest sphere enclosing frequently interacting devices. This clearly provides the fundamental motivation behind 3D technologies which vertically stack several strata of device and interconnect layers with high vertical interconnectivity. In addition, the ability to vertically stack strata with - vergent and even incompatible process ows provides for low cost and low parasitic integration of diverse technologies such as sensors, energy scavengers, nonvolatile memory, dense memory, fast memory, processors, and RF layers. These capabilities coupled with today's trends of increasing levels of integrated functionality, lower power, smaller form factor, increasingly divergent process ows, and functional diversi cation would seem to make 3D technologies a natural choice for most of the semiconductor industry. Since the concept of vertical integration of different strata has been around for over 20 years, why aren't vertically stacked strata endemic to the semiconductor industry The simple answer to this question is that in the past, the 3D advantages while interesting were not necessary due to the tremendous opportunities offered by geometric scaling. In addition, even when the global interconnect problem of high-performance single-core processors seemed insurmountable without inno- tions such as 3D, alternative architectural solutions such as multicores could eff- tivelydelaybutnoteliminatetheneedfor3D.
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - Three-dimensional (3D) integration is clearly the simplest answer to most of the semiconductor industry's vexing problems: heterogeneous integration and red- tions of power, form factor, delay, and even cost. Conceptually the power, latency, and form factor of a system with a xed number of transistors all scale roughly linearly with the diameter of the smallest sphere enclosing frequently interacting devices. This clearly provides the fundamental motivation behind 3D technologies which vertically stack several strata of device and interconnect layers with high vertical interconnectivity. In addition, the ability to vertically stack strata with - vergent and even incompatible process ows provides for low cost and low parasitic integration of diverse technologies such as sensors, energy scavengers, nonvolatile memory, dense memory, fast memory, processors, and RF layers. These capabilities coupled with today's trends of increasing levels of integrated functionality, lower power, smaller form factor, increasingly divergent process ows, and functional diversi cation would seem to make 3D technologies a natural choice for most of the semiconductor industry. Since the concept of vertical integration of different strata has been around for over 20 years, why aren't vertically stacked strata endemic to the semiconductor industry The simple answer to this question is that in the past, the 3D advantages while interesting were not necessary due to the tremendous opportunities offered by geometric scaling. In addition, even when the global interconnect problem of high-performance single-core processors seemed insurmountable without inno- tions such as 3D, alternative architectural solutions such as multicores could eff- tivelydelaybutnoteliminatetheneedfor3D.
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In den WarenkorbHardcover. Zustand: Brand New. 1st edition. 410 pages. 9.75x9.50x0.75 inches. In Stock.
Sprache: Englisch
Verlag: Kluwer Academic Publishers, 2002
ISBN 10: 1402071930 ISBN 13: 9781402071935
Anbieter: Kennys Bookstore, Olney, MD, USA
Zustand: New. Merges the complex chemical-mechanical planarization (CMP) models and mechanisms that have evolved over the years with experimental results with copper and low-kappa CMP to develop a comprehensive mechanism for low- and high-removal-rate processes. This book looks into the fundamental reaction kinetics. Num Pages: 229 pages, biography. BIC Classification: TDCP. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 234 x 156 x 15. Weight in Grams: 532. . 2002. Hardback. . . . . Books ship from the US and Ireland.
Verlag: ARTFORUM, 1980
Anbieter: castlebooksbcn, Barcelona, B, Spanien
Magazin / Zeitschrift
Encuadernación de tapa blanda. Zustand: Bien. Zustand des Schutzumschlags: Bien. Situation Esthetics: Impermanent Art and the Seventies Audience John Gutmann: A Transported Vision Carol Squiers Beuys: The Twilight of the Idol Benjamin H. D. Buchloh Willem de Kooning at the Pittsburgh International David Carrier Myron Stout s Complexity in Simplicity Tiffany Bell Dance : Lucinda Childs, Philip Glass and Sol LeWitt Deborah Perlberg David Reed s Paintings James Sherry Myth, Thermadorians and Solipsists Nicolas Calas COLUMNS FEATURES REVIEWS NEW YORK Stuart Morgan on Alice Aycock Stuart Morgan on Marco Bagnoli Stuart Morgan on Farrell Brickhouse Jeff Perrone on Robert Kushner Jeff Perrone on Willem de Kooning Jeff Perrone on Stefan Hirsch Jeff Perrone on Ron Gorchov Jeff Perrone on John McLaughlin Carrie Rickey on Philip Guston Carrie Rickey on Jennifer Bartlett Carrie Rickey on Steven Gianakos Carrie Rickey on Animals Living in Cities Hal Foster on Max Neuhaus Hal Foster on Richards Ruben Hal Foster on Lydia Dona Margaret Sheffield on Irving Petlin Margaret Sheffield on Don Gummer Judith Lopes Cardozo on Conrad Atkinson and Victor Burgin Judith Lopes Cardozo on Ed Kerns CAMBRIDGE Ronald J. Onorato on Corners DALLAS Fred Hoffman on Vernon Fisher LONDON Adrian Searle on Narrative Paintings Adrian Searle on John Hoyland LOS ANGELES Fred Hoffman on Chris Burden Fred Hoffman on DeWain Valentine Richard Armstrong on Jon Peterson SANTA BARBARA Richard Armstrong on Tom Wudl Richard Armstrong on Dialogue/Discourse/Research.