Verwandte Artikel zu Photopolymers: Photoresist Materials, Processes, and...

Photopolymers: Photoresist Materials, Processes, and Applications: 10 (Optics and Photonics) - Hardcover

 
9781466517288: Photopolymers: Photoresist Materials, Processes, and Applications: 10 (Optics and Photonics)
Alle Exemplare der Ausgabe mit dieser ISBN anzeigen:
 
 
Críticas:

"... a toolbox for individuals needing practical knowledge in the area of photopolymers and photoresist materials. It contains practical guidance in chemistry, fabrication, and industrial reduction-to-practice of photopolymer technology. The volume is comprised of five chapters. A major theme of the book is the relationship between photopolymer technology and the increasing miniaturization of electronic and mechanical devices. ... This short book has enough material to give a novice a good start in the field of photopolymer technology. It is written at a level appropriate for individuals with a chemistry or polymer engineering background."
―Thomas M. Cooper, Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio, USA, from MRS Bulletin, April 2015

"... fit for a chemist who wants to learn the physical principles of optical lithographic techniques."
―Dejan Pantelić, Institute of Physics, Belgrade, Serbia, from Optics & Photonics News, April 2015

Reseña del editor:

Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more.

Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, Photopolymers: Photoresist Materials, Processes, and Applications covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the world’s largest corporations. Offering a state-of-the-art review of progress in the development of photopolymers, this book provides valuable insight into current and future opportunities for photopolymer use.

„Über diesen Titel“ kann sich auf eine andere Ausgabe dieses Titels beziehen.

  • VerlagCRC Press
  • Erscheinungsdatum2014
  • ISBN 10 146651728X
  • ISBN 13 9781466517288
  • EinbandTapa dura
  • Auflage1
  • Anzahl der Seiten189

Gebraucht kaufen

Most items will be dispatched the... Mehr zu diesem Angebot erfahren

Versand: EUR 9,27
Von Vereinigtes Königreich nach USA

Versandziele, Kosten & Dauer

In den Warenkorb

Beste Suchergebnisse beim ZVAB

Foto des Verkäufers

Nakamura, Kenichiro
Verlag: CRC Press (2014)
ISBN 10: 146651728X ISBN 13: 9781466517288
Gebraucht Hardcover Anzahl: 1
Anbieter:
WeBuyBooks
(Rossendale, LANCS, Vereinigtes Königreich)
Bewertung

Buchbeschreibung Zustand: VeryGood. Most items will be dispatched the same or the next working day. Artikel-Nr. wbs8873515737

Weitere Informationen zu diesem Verkäufer | Verkäufer kontaktieren

Gebraucht kaufen
EUR 155,55
Währung umrechnen

In den Warenkorb

Versand: EUR 9,27
Von Vereinigtes Königreich nach USA
Versandziele, Kosten & Dauer