Sprache: Englisch
Verlag: The Institution of Engineering and Technology, 2016
ISBN 10: 1849199973 ISBN 13: 9781849199971
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
EUR 127,91
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In den WarenkorbZustand: New. In English.
Sprache: Englisch
Verlag: The Institution of Engineering and Technology, 2016
ISBN 10: 184919999X ISBN 13: 9781849199995
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
EUR 127,91
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In den WarenkorbZustand: New. In English.
Sprache: Englisch
Verlag: Inst of Engineering & Technology, 2016
ISBN 10: 1849199973 ISBN 13: 9781849199971
Anbieter: Revaluation Books, Exeter, Vereinigtes Königreich
EUR 181,58
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In den WarenkorbHardcover. Zustand: Brand New. 368 pages. 9.25x6.25x1.00 inches. In Stock.
Sprache: Englisch
Verlag: INSTITUTION OF ENGINEERING & T, 2016
ISBN 10: 1849199973 ISBN 13: 9781849199971
Anbieter: moluna, Greven, Deutschland
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In den WarenkorbZustand: New. Inhaltsverzeichnisrnrnn Chapter 1: High-κ dielectrics and device reliabilityn Chapter 2: High mobility n and p channels on gallium arsenide and silicon substrates using interfacial misfit dislocation arraysn Chapte.
Sprache: Englisch
Verlag: Institution Of Engineering & Technology Apr 2016, 2016
ISBN 10: 1849199973 ISBN 13: 9781849199971
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Buch. Zustand: Neu. Neuware - The demand for ever smaller and portable electronic devices has driven metal oxide semiconductor-based (CMOS) technology to its physical limit with the smallest possible feature sizes. This presents various size-related problems such as high power leakage, low-reliability, and thermal effects, and is a limit on further miniaturization. To enable even smaller electronics, various nanodevices including carbon nanotube transistors, graphene transistors, tunnel transistors and memristors (collectively called post-CMOS devices) are emerging that could replace the traditional and ubiquitous silicon transistor. This book explores these nanoelectronics at the device level including modelling and design. Topics covered include high-k dielectrics; high mobility n and p channels on gallium arsenide and silicon substrates using interfacial misfit dislocation arrays; anodic metal-insulator-metal (MIM) capacitors; graphene transistors; junction and doping free transistors; nanoscale gigh-k/metal-gate CMOS and FinFET based logic libraries; multiple-independent-gate nanowire transistors; carbon nanotubes for efficient power delivery; timing driven buffer insertion for carbon nanotube interconnects; memristor modeling; and neuromorphic devices and circuits. This book is essential reading for researchers, research-focused industry designers/developers, and advanced students working on next-generation electronic devices and circuits.