Isbn: 9783736975200 - new approaches to reliability qualification of semiconductor components under varying and progressive stresses (3 Ergebnisse)

ISBN: 
Mit der Detailsuche verfeinern

Optimieren Sie Ihre Suche

  • Bücher (3)

bis

Benutzerdefinierte Preisspanne (EUR)

bis

  • Sprache: Englisch

    Verlag: Cuvillier, 2021

    3736975201 / 9783736975200

    • Softcover

    Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes KönigreichRia Christie Collections

    Verkäufer/-in mit 5 Sternen
    Verkäufer/-in kontaktieren

    Zustand: Neu

    EUR 51,37

    EUR 11,07 Versand 
    Versand von Vereinigtes Königreich nach USA

    Anzahl: Mehr als 20 verfügbar

    Zustand: New. In English.

  • Sprache: Englisch

    Verlag: Cuvillier, 2021

    3736975201 / 9783736975200

    • Softcover

    Anbieter: Buchpark, Trebbin, DeutschlandBuchpark

    Verkäufer/-in mit 5 Sternen
    Verkäufer/-in kontaktieren

    Zustand: Gebraucht - Sehr gut

    EUR 43,94

    EUR 105,00 Versand 
    Versand von Deutschland nach USA

    Anzahl: 1 verfügbar

    Zustand: Sehr gut. Zustand: Sehr gut | Sprache: Englisch | Produktart: Bücher | In the present work, urgent issues in the reliability qualification of semiconductor devices are addressed, which particularly affect value chains such as those in the automotive industry. These have particularly high requirements for long lifetime and low failure rates of their products, which are additionally exposed to more extreme operating and environmental conditions than in most other areas of application. In particular, the question arises on how to assess a product or semiconductor technology against the requirement of an application-specific mission profile with multiple non-constant stressors. For this purpose, the behavior of failure distributions under varying and progressive stress loads is investigated and described using cumulative damage models. For the first time, the industry-wide approach of transforming non-constant mission profiles into effective constant stress and test conditions for reliability assessment and qualification can be physically justified and substantiated with measurement data. This stress transformation is exemplified using the time-dependent dielectric breakdown (TDDB) failure mechanism with the two stressors voltage and temperature; and then extended to include the use of multi-dimensional mission profiles and interdependent stressors. These measurements are performed on university metal¿oxide¿semiconductor (MOS) capacitors as well as on commercially available state-of-the-art transistors. Finally, it is demonstrated that the obtained findings in the field of cumulative damage can be applied to use reliability studies with ramp-stress for acceleration model verification and to determine model parameters with less time and experimental effort.…

  • Sprache: Englisch

    Verlag: Cuvillier, 2021

    3736975201 / 9783736975200

    • Softcover

    Anbieter: Buchpark, Trebbin, DeutschlandBuchpark

    Verkäufer/-in mit 5 Sternen
    Verkäufer/-in kontaktieren

    Zustand: Gebraucht

    EUR 45,26

    EUR 105,00 Versand 
    Versand von Deutschland nach USA

    Anzahl: 2 verfügbar

    Zustand: Hervorragend. Zustand: Hervorragend | Sprache: Englisch | Produktart: Bücher | In the present work, urgent issues in the reliability qualification of semiconductor devices are addressed, which particularly affect value chains such as those in the automotive industry. These have particularly high requirements for long lifetime and low failure rates of their products, which are additionally exposed to more extreme operating and environmental conditions than in most other areas of application. In particular, the question arises on how to assess a product or semiconductor technology against the requirement of an application-specific mission profile with multiple non-constant stressors. For this purpose, the behavior of failure distributions under varying and progressive stress loads is investigated and described using cumulative damage models. For the first time, the industry-wide approach of transforming non-constant mission profiles into effective constant stress and test conditions for reliability assessment and qualification can be physically justified and substantiated with measurement data. This stress transformation is exemplified using the time-dependent dielectric breakdown (TDDB) failure mechanism with the two stressors voltage and temperature; and then extended to include the use of multi-dimensional mission profiles and interdependent stressors. These measurements are performed on university metal¿oxide¿semiconductor (MOS) capacitors as well as on commercially available state-of-the-art transistors. Finally, it is demonstrated that the obtained findings in the field of cumulative damage can be applied to use reliability studies with ramp-stress for acceleration model verification and to determine model parameters with less time and experimental effort.…