Isbn: 9781402051876 - design for manufacturability and yield for nano-scale cmos (integrated circuits and systems) (8 Ergebnisse)

Zustand: New. Brand New. Soft Cover International Edition. Different ISBN and Cover Image. Priced lower than the standard editions which is usually intended to make them more affordable for students abroad. The core content of the book is generally the same as the standard edition. The country selling restrictions may be printed on the book but is no problem for the self-use. This Item maybe shipped from US or any other country as we have multiple locations worldwide.…

Zustand: Good. : Este libro aborda el diseño para la fabricabilidad y el rendimiento de CMOS a nanoescala. Explora los desafíos y soluciones en el diseño de circuitos integrados a nanoescala, centrándose en la optimización para la fabricación y el rendimiento. Cubre temas como la variabilidad del proceso, la gestión de la energía y las técnicas de diseño para mejorar la fiabilidad y el rendimiento de los sistemas CMOS a nanoescala. EAN: 9781402051876 Tipo: Libros Categoría: Tecnología|Ciencias Título: Design for Manufacturability and Yield for Nano-Scale CMOS Autor: Charles Chiang| Jamil Kawa Editorial: Springer Idioma: eng Páginas: 253 Formato: tapa dura.…

Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Zustand: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Zustand: New. In.

Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design's manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.…