Anbieter: Universitätsbuchhandlung Herta Hold GmbH, Berlin, Deutschland
Softcover reprint of the original 1st ed. 2002. 16 x 23 cm. 363 pages. Paperback. Versand aus Deutschland / We dispatch from Germany via Air Mail. Einband bestoßen, daher Mängelexemplar gestempelt, sonst sehr guter Zustand. Imperfect copy due to slightly bumped cover, apart from this in very good condition. Stamped. Sprache: Englisch.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
EUR 115,13
Anzahl: Mehr als 20 verfügbar
In den WarenkorbZustand: New. In.
Taschenbuch. Zustand: Neu. Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies | Y. Pauleau | Taschenbuch | xiii | Englisch | 2002 | Springer | EAN 9781402005251 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.
Sprache: Englisch
Verlag: Kluwer Academic Publishers, 2002
ISBN 10: 1402005253 ISBN 13: 9781402005251
Anbieter: Kennys Bookstore, Olney, MD, USA
Zustand: New. Proceedings of the NATO Advanced Study Institute, held in Kaunas, Lithuania, from 3-14 September 2001 Editor(s): Pauleau, Y. Series: NATO Science Series II. Num Pages: 363 pages, biography. BIC Classification: PHF. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 234 x 156 x 20. Weight in Grams: 537. . 2002. Softcover reprint of the original 1st ed. 2002. Paperback. . . . . Books ship from the US and Ireland.
Sprache: Englisch
Verlag: Springer, Springer Netherlands, 2002
ISBN 10: 1402005253 ISBN 13: 9781402005251
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes.A handbook for engineers and scientists and an introduction for students of microelectronics.