Preparation and characterization of low-k material for microelectronics:: Possible development of mechanical characterization at submicrometric scales with laser ultrasonics technique - Softcover

Preparation and characterization of low-k material for microelectronics:

Taschenbuch. Zustand: Neu. Neuware -On the morning of my professional career, as research and development engineer, I had the chance to work at the Institute of Micro Electronic Center (IMEC). This book presents the work I have done from February till September 2007 and its focuses on the investigation of mechanical properties of low-k materials using opto-acoustic technique. Before approaching the opto-acoustic method itself, I practiced the techniques of thin films deposition, plasma treatment and spectro-ellipsometric characterization of materials. Unlike spectro-ellipsometric thin films study, the opto-acoustic characterization requires working with samples which include a transducer material. So, at first, we have designed some samples geometries to be analyzed. The goal of this comparative study (mechanic and acoustic) is not only to establish a correlation between nanoindentation and acoustic wave techniques, but also to determine the factors which best describe mechanical properties of low-k materials. The work has been done in collaboration with the Laboratory of Condensed Matter Physics (LPEC), located in Le Mans (France).Books on Demand GmbH, Überseering 33, 22297 Hamburg 84 pp. Englisch. Artikel-Nr. 9786204208480

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