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Inhaltsangabe
This book describes the SRAM design concept in FinFET technologies using unique features of non-planar double-gated devices. The parameter space required to design FinFETs will be explored. Variety of SRAM design techniques will be presented exploiting the advantages of tied gate and independent gate controlled configurations. SRAM performance, power, and stability for FinFET devices are compared with conventional planar CMOS counterparts. Modeling the variability of FinFETs through statistics will be presented as well. The MOSFET device was compared with both Poly silicon and Molybdenum as gate material and the FinFET device was designed with different gate materials like Gold, Tungsten, Tantalum and Molybdenum and results were compared with Poly silicon gate material devices.
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This book describes the SRAM design concept in FinFET technologies using unique features of non-planar double-gated devices. The parameter space required to design FinFETs will be explored. Variety of SRAM design techniques will be presented exploiting the advantages of tied gate and independent gate controlled configurations. SRAM performance, power, and stability for FinFET devices are compared with conventional planar CMOS counterparts. Modeling the variability of FinFETs through statistics will be presented as well. The MOSFET device was compared with both Poly silicon and Molybdenum as gate material and the FinFET device was designed with different gate materials like Gold, Tungsten, Tantalum and Molybdenum and results were compared with Poly silicon gate material devices.
Biografía del autor
Mr. M.Manikandan currently pursuing his Doctoral degree in the area of Photonics in Karunya University, Coimbatore. He has published 11 research article in International Journals including SCI Journals and 3 research article in International National Conferences. .Currently, he is working at KPR Institute of Engineering & Technology, Coimbatore
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Performance Enhancement of SRAM FINFET using different Gate materials
Verlag:
LAP LAMBERT Academic Publishing Dez 2017, 2017
ISBN 10: 6202094281
ISBN 13: 9786202094283
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Taschenbuch
Anbieter: buchversandmimpf2000, Emtmannsberg, BAYE, Deutschland
Verkäuferbewertung 5 von 5 Sternen
Taschenbuch. Zustand: Neu. Neuware -This book describes the SRAM design concept in FinFET technologies using unique features of non-planar double-gated devices. The parameter space required to design FinFETs will be explored. Variety of SRAM design techniques will be presented exploiting the advantages of tied gate and independent gate controlled configurations. SRAM performance, power, and stability for FinFET devices are compared with conventional planar CMOS counterparts. Modeling the variability of FinFETs through statistics will be presented as well. The MOSFET device was compared with both Poly silicon and Molybdenum as gate material and the FinFET device was designed with different gate materials like Gold, Tungsten, Tantalum and Molybdenum and results were compared with Poly silicon gate material devices.Books on Demand GmbH, Überseering 33, 22297 Hamburg 52 pp. Englisch. Artikel-Nr. 9786202094283
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Performance Enhancement of SRAM FINFET using different Gate materials
Verlag:
LAP LAMBERT Academic Publishing, 2017
ISBN 10: 6202094281
ISBN 13: 9786202094283
Neu
Paperback
Anbieter: Revaluation Books, Exeter, Vereinigtes Königreich
Verkäuferbewertung 5 von 5 Sternen
Paperback. Zustand: Brand New. 52 pages. 8.66x5.91x0.12 inches. In Stock. Artikel-Nr. zk6202094281
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