Flux Profile Modeling using Monte Carlo Simulation: A simulation tool for deposition processess using Molecular Beam Epitaxy - Softcover
Inhaltsangabe
Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers.
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Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers.
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Flux Profile Modeling using Monte Carlo Simulation
Verlag:
LAP LAMBERT Academic Publishing Jun 2010, 2010
ISBN 10: 3838369386
ISBN 13: 9783838369389
Neu
Taschenbuch
Anbieter: buchversandmimpf2000, Emtmannsberg, BAYE, Deutschland
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Taschenbuch. Zustand: Neu. Neuware -Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers.Books on Demand GmbH, Überseering 33, 22297 Hamburg 104 pp. Englisch. Artikel-Nr. 9783838369389
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Flux Profile Modeling using Monte Carlo Simulation | A simulation tool for deposition processess using Molecular Beam Epitaxy
Verlag:
LAP LAMBERT Academic Publishing, 2010
ISBN 10: 3838369386
ISBN 13: 9783838369389
Neu
Taschenbuch
Anbieter: preigu, Osnabrück, Deutschland
Verkäuferbewertung 5 von 5 Sternen
Taschenbuch. Zustand: Neu. Flux Profile Modeling using Monte Carlo Simulation | A simulation tool for deposition processess using Molecular Beam Epitaxy | Ramprasad Vijayagopal (u. a.) | Taschenbuch | 104 S. | Englisch | 2010 | LAP LAMBERT Academic Publishing | EAN 9783838369389 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu. Artikel-Nr. 101044375
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