Verwandte Artikel zu Magnetron Sputtered Copper Nitride Films for Optical...
Inhaltsangabe
Thin films of copper nitride received much attention because of their wide range of applications such as write-once optical recording, insulating barrier in magnetic tunnel junctions, generating microscopic copper lines by maskless laser writing or copper dots by maskless electron beam writing. The physical properties of the deposited films depend mainly on the deposition technique employed and the process parameters maintained during the growth of the films. This book restrains the optimized preparation condition of copper nitride films using dc reactive magnetron sputtering technique by precisely controlling the process parameters, and investigated the physical properties of the films. The promising approach to prepare the device quality copper nitride films for optical recording devices was discussed clearly in this book.
Die Inhaltsangabe kann sich auf eine andere Ausgabe dieses Titels beziehen.
Über die Autorin bzw. den Autor
Dr.K.Venkata Subba Reddy has carried out research work on metal nitride thin films for optical storage devices, and he obtained Ph.D. Degree in Physics from S.V.University in the year 2007 under the supervision of Prof. S. Uthanna. At present he is working as a reader in the Department of Physics, S.B.V.R. Degree College, Badvel, A.P. Inida.
„Über diesen Titel“ kann sich auf eine andere Ausgabe dieses Titels beziehen.
Neu kaufen
Diesen Artikel anzeigen
EUR 55,90
Gratis für den Versand innerhalb von/der Deutschland
Versandziele, Kosten & DauerSuchergebnisse für Magnetron Sputtered Copper Nitride Films for Optical...
Foto des Verkäufers
Magnetron Sputtered Copper Nitride Films for Optical Storage Devices
Verlag:
LAP LAMBERT Academic Publishing Jun 2016, 2016
ISBN 10: 3659901415
ISBN 13: 9783659901416
Neu
Taschenbuch
Anbieter: buchversandmimpf2000, Emtmannsberg, BAYE, Deutschland
Verkäuferbewertung 5 von 5 Sternen
Taschenbuch. Zustand: Neu. Neuware -Thin films of copper nitride received much attention because of their wide range of applications such as write-once optical recording, insulating barrier in magnetic tunnel junctions, generating microscopic copper lines by maskless laser writing or copper dots by maskless electron beam writing. The physical properties of the deposited films depend mainly on the deposition technique employed and the process parameters maintained during the growth of the films. This book restrains the optimized preparation condition of copper nitride films using dc reactive magnetron sputtering technique by precisely controlling the process parameters, and investigated the physical properties of the films. The promising approach to prepare the device quality copper nitride films for optical recording devices was discussed clearly in this book.Books on Demand GmbH, Überseering 33, 22297 Hamburg 132 pp. Englisch. Artikel-Nr. 9783659901416
Anzahl: 2 verfügbar
Beispielbild für diese ISBN
Magnetron Sputtered Copper Nitride Films for Optical Storage Devices
Verlag:
LAP LAMBERT Academic Publishing, 2016
ISBN 10: 3659901415
ISBN 13: 9783659901416
Neu
Paperback
Anbieter: Revaluation Books, Exeter, Vereinigtes Königreich
Verkäuferbewertung 5 von 5 Sternen
Paperback. Zustand: Brand New. 132 pages. 8.66x5.91x0.30 inches. In Stock. Artikel-Nr. 3659901415
Anzahl: 1 verfügbar