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Synthesis of Titanium Based Nitride Thin Films By Plasma Focus: Application of Dense Plasma Focus System (DPF) in Materials Science - Softcover

 
9783659295331: Synthesis of Titanium Based Nitride Thin Films By Plasma Focus: Application of Dense Plasma Focus System (DPF) in Materials Science

Inhaltsangabe

The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics.

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Reseña del editor

The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics.

Biografía del autor

Tousif Hussain was born in Faisalabad, Pakistan on 08 November, 1979. He earned a PhD degree in Physics/Materials Science from GC University Lahore, Pakistan. He is working as Assistant Professor at Center for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan. He has numerous scientific research publications in refereed journals.

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  • VerlagLAP LAMBERT Academic Publishing
  • Erscheinungsdatum2012
  • ISBN 10 3659295337
  • ISBN 13 9783659295331
  • EinbandTapa blanda
  • SpracheEnglisch
  • Anzahl der Seiten168
  • Kontakt zum HerstellerNicht verfügbar

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Taschenbuch. Zustand: Neu. Neuware -The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics.Books on Demand GmbH, Überseering 33, 22297 Hamburg 168 pp. Englisch. Artikel-Nr. 9783659295331

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