The Chemistry of Metal CVD - Hardcover

This work, which considers the chemistry of metals, includes methods of preparing ultra-thin metal films and chemical vapour deposition (CVD), with an emphasis on microelectronics applications. Chapter One, an introduction, discusses the applications of metal CVD as well as the types of processes used for metal deposition, and rationalizes which materials are used and why they are chosen. Chapters Two through Eight discuss CVD of Al (2), W (3), Cu from Cu(II) precursors (4), Cu from Cu(I) precursors (5), Au and Ag (6), Pt, Pd and Ni (7), and CVD of Ta, Cr, Mo, Fe, Co, Rh, Ir and less common metals (8). Chapter 9 summarizes the results from these chapters. Some fundamental physical and chemical phenomena that occur in CVD reactors are also discussed to provide a basis from which data in the literature can be interpreted. The goal of this work is to bring together all aspects of the CVD of metals in a way that is useful for all those who work in this field. The book should be suitable for scientists developing novel coating techniques.

T. Kodas, M. Hampden-Smith The Chemistry of Metal CVD This is the first handbook on chemical vapor deposition (CVD) that focuses on the deposition of metallic coatings, an important process in electronics, corrosion protection, and finishing technologies. It offers a thorough, up-to-date coverage of the chemistry behind the CVD of metals, including the rationale for materials selection and compatibility. Contributions by leading scientists cover the deposition of metals, emphasizing aluminum, tungsten, gold, silver, platinum, palladium, nickel, copper, and other transition metals. The topics discussed include: synthesis and properties of the precursors, growth processes, purity, quality, morphology and adhesion of the resulting films as well as laser-, plasma- and ion -assisted deposition methods. The final chapter is a valuable summary and provides critical insight into which precursors, precursor delivery systems, and reactors to choose for different deposition behavior and how to interpret information obtained from CVD processes. With well over 1,000 references, this handbook is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal-coating processes and technologies.