The Chemistry of Metal Cvd

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9781560818137: The Chemistry of Metal Cvd

High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies.

From Reviews:
'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.'
J. Am Chem. Soc.

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From the Publisher:

This book offers detailed, up-to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as cooper from copper (I) and copper (II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser-assisted, ion-assisted and plasma-assisted methods are discussed. Present applications and prospect for future developments are summarized. With ca. 1,000 references and a glossary, this book is a unique source of in-depth information.

From the Back Cover:

T. Kodas, M. Hampden-Smith The Chemistry of Metal CVD This is the first handbook on chemical vapor deposition (CVD) that focuses on the deposition of metallic coatings, an important process in electronics, corrosion protection, and finishing technologies. It offers a thorough, up-to-date coverage of the chemistry behind the CVD of metals, including the rationale for materials selection and compatibility. Contributions by leading scientists cover the deposition of metals, emphasizing aluminum, tungsten, gold, silver, platinum, palladium, nickel, copper, and other transition metals. The topics discussed include: synthesis and properties of the precursors, growth processes, purity, quality, morphology and adhesion of the resulting films as well as laser-, plasma- and ion -assisted deposition methods. The final chapter is a valuable summary and provides critical insight into which precursors, precursor delivery systems, and reactors to choose for different deposition behavior and how to interpret information obtained from CVD processes. With well over 1,000 references, this handbook is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal-coating processes and technologies.

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