Inhaltsangabe
Contributors; Preface; Section I: Photoreactive polymers: history and state of the art: Asphalt as the world's first photopolymer--Jean-Louis Marignier; Recent developments in radiation curing chemistry--Christian Decker; Section II: Processes in photoreactive polymers: Time resolved laser spectroscopy of excited state processes in photoimaging systems--Jean-Pierre Fouassier; Hexaarylbiimidazolyl: the choice initiator for photopolymers: history of synthesis and investigation of photochemical properties--Koko Maeda; Visible light photoinitiation systems based on electron and energy transfer process--Tsuguo Yamaoka and K. Naitoh; Investigation of electron transfer between hexaarylbiimidazole and visible sensitizer--Yi Lin, Andong Liu, and Alexander D. Trifunac; Diffusion in polymer matrix and anisotropic photopolymerization--Vadim V. Krongauz; Benzoin ether photoinitiators bound to acrylated prepolymers--Kwang-Duk Ahn; Photosensitive liquid crystalline polymers--Carolyn Bowry-Devereaux; Section III: Photosensitive polymer in advanced applications: Holographic recording materials--Roger A. Lessard, Rupak Changkakoti, and Gurusamy Manivannan; Photoresists and their development--Nigel P. Hacker.
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