Total-Reflection X-Ray Fluorescence Analysis and Related Methods (Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications, Band 181) - Hardcover

Über die Autorin bzw. den Autor

Reinhold Klockenkämper is physicist and was head of the Physical Analysis Research Group at ISAS in Dortmund, Germany. Furthermore, he was Associate Lecturer at the University of Applied Sciences in Dortmund. His experience in X-ray spectral analysis spans four decades and he published over 100 scientific papers and several book articles. He was member of three Editorial Advisory Boards of international journals for many years. In 1988 and 1996 he organized the 2nd and the 6th conference on TXRF in Dortmund. In 1996 he published the first edition of this monograph on TXRF. Professor Klockenkämper retired in 2002, but is currently working as guest scientist at ISAS. Alex von Bohlen is engineer and senior scientist at the Leibniz-Institut für Analytische Wissenschaften -ISAS- e.V. in Dortmund. He is head of the X-ray laboratories and of the scanning electron and optical microscopy facilities. In addition, he is responsible for the beamline 2 at DELTA, Center for Synchrotron Radiation at the Technical University of Dortmund. Dr. von Bohlen has been working in the field of TXRF since more than 25 years, has published more than 120 articles, mostly dedicated to TXRF, and is member of two Editorial Advisary Boards. In 2011 he organized the 14th conference on TXRF in Dortmund.

Von der hinteren Coverseite

Total-reflection X-ray fluorescence, or TXRF, and its related methods have been used increasingly for multi element analysis in laboratories and industry worldwide. Providing reliable, economical readings of the minute mass or extremely low concentration of elements, TXRF is especially suitable for ultramicro- and trace analysis. It is also effective in the analysis of flat sample surfaces and stratified near-surface layers, offering a nondestructive means of quality control of wafers for the semiconductor industry by a fast mapping of possible unwanted contaminations.

The new edition is completely updated and nearly doubled. Particular emphasis has been placed on new methods and techniques including: Silicon-drift detector with Peltier-cooling, powerful and particular excitation by synchrotron radiation, simple wavelength-dispersive X-ray spectrometer especially for light element detection and speciation, TXRF after chemical and physical etching of thin layers to give information on the nanometer-scale, GI-XRF for non-destructive depth profiling of thin flat coverings and implantations, TXRF combined with EXAFS, XANES, XRD, and XPS to gain insight into the molecular and even into the electronic structure of atoms.

Total-Reflection X-Ray Fluorescence Analysis helps professionals evaluate the suitability of this method to their specific needs, pinpoint new applications, and gain insight into the future of TXRF. It is an excellent text for graduate students and a useful guide for scientists and technicians in a wide range of fields.

Total-Reflection X-ray Fluorescence Analysis and Related Methods, Second Edition features:

• The uses of TXRF in ultramicro- and trace analysis, and in surface- and near-surface-layer analysis
• Instrumentation and setups, particularly high-power X-ray sources, beam-adapting units, sample positioning, and energy-dispersive detection and registration
• Explores new applications of TRXF since the publication of the first edition
• Offers helpful tips on performing analyses, including sample preparations, and spectra recording and interpretation
• Includes about 700 references for further study

Written by leading experts in X-ray spectral analysis, the second edition provides an overview of the field, reveals the advantages of TXRF over competing methods, and describes its application in numerous fields, including biology, biomonitoring, material and life sciences, medicine, toxicology, forensics, art history, and archaeometry.

Aus dem Klappentext

Total-reflection X-ray fluorescence, or TXRF, and its related methods have been used increasingly for multi element analysis in laboratories and industry worldwide. Providing reliable, economical readings of the minute mass or extremely low concentration of elements, TXRF is especially suitable for ultramicro- and trace analysis. It is also effective in the analysis of flat sample surfaces and stratified near-surface layers, offering a nondestructive means of quality control of wafers for the semiconductor industry by a fast mapping of possible unwanted contaminations.
 
The new edition is completely updated and nearly doubled. Particular emphasis has been placed on new methods and techniques including: Silicon-drift detector with Peltier-cooling, powerful and particular excitation by synchrotron radiation, simple wavelength-dispersive X-ray spectrometer especially for light element detection and speciation, TXRF after chemical and physical etching of thin layers to give information on the nanometer-scale, GI-XRF for non-destructive depth profiling of thin flat coverings and implantations, TXRF combined with EXAFS, XANES, XRD, and XPS to gain insight into the molecular and even into the electronic structure of atoms.
Total-Reflection X-Ray Fluorescence Analysis helps professionals evaluate the suitability of this method to their specific needs, pinpoint new applications, and gain insight into the future of TXRF. It is an excellent text for graduate students and a useful guide for scientists and technicians in a wide range of fields.
 
Total-Reflection X-ray Fluorescence Analysis and Related Methods, Second Edition features:
* The uses of TXRF in ultramicro- and trace analysis, and in surface- and near-surface-layer analysis
* Instrumentation and setups, particularly high-power X-ray sources, beam-adapting units, sample positioning, and energy-dispersive detection and registration
* Explores new applications of TRXF since the publication of the first edition
* Offers helpful tips on performing analyses, including sample preparations, and spectra recording and interpretation
* Includes about 700 references for further study
 
Written by leading experts in X-ray spectral analysis, the second edition provides an overview of the field, reveals the advantages of TXRF over competing methods, and describes its application in numerous fields, including biology, biomonitoring, material and life sciences, medicine, toxicology, forensics, art history, and archaeometry.