Presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, this book provides considerable insight into Japan's technological effort in this important area of science. Focuses on research involving plasma deposition and dry etching. Considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.
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Anbieter: A & I PEDERSEN, Macclesfield, CHS, Vereinigtes Königreich
Hard Cover. First English Language Edition. Hard blue covers, content is as new, ex library copy with usual stamps and labels, no pocket and no external markings, otherwise a fine copy, pp xiv,394. Text figures and diagrams throughout. Size: 16x24cm. Artikel-Nr. 005143
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