EUVL is an area of intense research and this book provides the foundation required for understanding and applying this technology. It offers contributions from the world's leading EUVL researchers, and provides all the critical information needed by practitioners and those wanting to enter the field.
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Dr. Vivek Bakshi has been active for many years as an EUV source specialist. He previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.Review:
Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. This book proceeds from an historical perspective of EUV lithography through source technology, optics, projection system design, mask, resist, and patterning performance to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner--this book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc., Japan
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