Defect-Induced Magnetism in Oxide Semiconductors provides an overview of the latest advances in defect engineering to create new magnetic materials and enable new technological applications. First, the book introduces the mechanisms, behavior, and theory of magnetism in oxide semiconductors and reviews the methods of inducing magnetism in these materials. Then, strategies such as pulsed laser deposition and RF sputtering to grow oxide nanostructured materials with induced magnetism are discussed. This is followed by a review of the most relevant postdeposition methods to induce magnetism in oxide semiconductors including annealing, ion irradiation, and ion implantation. Examples of defect-induced magnetism in oxide semiconductors are provided along with selected applications. This book is a suitable reference for academic researchers and practitioners and for people engaged in research and development in the disciplines of materials science and engineering.
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Dr. Parmod Kumar is an assistant professor in the Department of Physics at JC Bose University of Science and Technology, Faridabad, Haryana, India. Dr. Kumar earned his PhD from the IIT Delhi, India and also worked as DST-INSPIRE Faculty. His research interests include dilute magnetic semiconductors, magnetic materials, and other oxide semiconductors.
Jitendra Pal Singh is the Ramanujan Fellow at the Manav Rachna University, Faridabad, India. His research interests are irradiation studies in nanoferrites, thin films, and magnetic multilayers, including the synthesis of ferrite nanoparticles and thin films, determining the magnetic, optical, and dielectric response of ferrites, and irradiation and implantation effects in ferrite thin films and nanoparticles.
Vinod Kumar is a lecturer in renewable energy in the Department of Physics at The University of the West Indies, St. Augustine Campus, Trinidad and Tobago. His current research interest area is oxide-based nanomaterial for lighting and solar cell applications.
Defect-Induced Magnetism in Oxide Semiconductors provides an overview of the latest advances in defect engineering to create new magnetic materials and enable new technological applications. First, the book introduces the mechanisms, behavior, and theory of magnetism in oxide semiconductors and reviews the methods of inducing magnetism in these materials. Then, strategies such as pulsed laser deposition and RF sputtering to grow oxide nanostructured materials with induced magnetism are discussed. This is followed by a review of the most relevant postdeposition methods to induce magnetism in oxide semiconductors including annealing, ion irradiation, and ion implantation. Examples of defect-induced magnetism in oxide semiconductors are provided along with selected applications.
This book is a suitable reference for academic researchers and practitioners and for people engaged in research and development in the disciplines of materials science and engineering.
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Paperback. Zustand: Brand New. 750 pages. 9.00x6.00x5.91 inches. In Stock. Artikel-Nr. __0323909078
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